Resonant frequency tuning of micromachined mirror assembly

ABSTRACT

Embodiments of the disclosure provide a micromachined mirror assembly. The micromachined mirror assembly includes a micro mirror configured to tilt around an axis and a first and a second torsion beam each having a first and a second end. The second end of the first torsion beam and the second end of the second torsion beam are mechanically coupled to the micro mirror along the axis. The micromachined mirror assembly also includes a first DC voltage applied to the first end of the first torsion beam and a second DC voltage, different from the first DC voltage, is applied to the first end of the second torsion beam.

CROSS-REFERENCE TO RELATED APPLICATION

This is a continuation to U.S. application Ser. No. 16/658,007, filedOct. 18, 2019, which is incorporated by reference in its entiretyherein.

TECHNICAL FIELD

The present disclosure relates to a micromachined mirror assembly, andmore particularly to, a micromachined mirror assembly used in a scannerfor light detection and ranging (LiDAR).

BACKGROUND

LiDAR systems have been widely used in autonomous driving and producinghigh-definition maps. For example, LiDAR systems measure distance to atarget by illuminating the target with pulsed laser light and measuringthe reflected pulses with a sensor. Differences in laser return timesand wavelengths can then be used to make digital three-dimensional (3-D)representations of the target. The laser light used for LiDAR scan maybe ultraviolet, visible, or near infrared. Because using a narrow laserbeam as the incident light from the scanner can map physical featureswith very high resolution, a LiDAR system is particularly suitable forapplications such as high-definition map surveys.

The scanner of a LiDAR system includes a mirror that can be moved (e.g.,rotated) by actuators to reflect (and steer) incident laser beams from alaser source towards a predetermined angle. The mirror can be a single,or an array of micromachined mirror assembly(s) made by semiconductormaterials using microelectromechanical system (MEMS) technologies. Inorder to maximize the deflection angle of the micromachined mirrorassemblies for a given voltage, they are operated in their resonantfrequency. However, due to fabrication process variations, resonantfrequency of each of the micromachined mirror of the same array ofmicromachined mirror assembly(s) may vary. For example, structuresetched on a single crystalline wafer may suffer from greater fabricationprocess variations (e.g., the lower part of the structure is narrowerthan the design due to the etching process) when the structure is closerto the edge of the wafer comparing to structures that is located in thecenter of the wafer. Thus, achieving the target resonant frequencybecomes especially important when multiple micro mirrors need to besynchronized to operate at the same resonant frequency.

Embodiments of the disclosure address the above problems by an improvedmicromachined mirror assembly in a scanner for LiDAR.

SUMMARY

Embodiments of the disclosure provide a micromachined mirror assembly.The micromachined mirror assembly includes a micro mirror configured totilt around an axis and a first and a second torsion beam each having afirst and a second end. The second end of the first torsion beam and thesecond end of the second torsion beam are mechanically coupled to themicro mirror along the axis. The micromachined mirror assembly alsoincludes a first DC voltage applied to the first end of the firsttorsion beam and a second DC voltage, different from the first DCvoltage, is applied to the first end of the second torsion beam.

Embodiments of the disclosure also provide another micromachined mirrorassembly. The micromachined mirror assembly includes a micro mirrorconfigured to tilt around an axis and a first and a second torsion beameach mechanically coupled to the micro mirror along the axis. Themicromachined mirror assembly also includes a first torsional actuatormechanically coupled to the first torsion beam and configured to apply afirst torsional stress around the axis to the first torsion beam and asecond actuator mechanically coupled to the second torsion beam andconfigured to apply a second torsional stress around the axis to thesecond torsion beam. The micromachined mirror assembly further includesa DC voltage difference applied to the first torsion beam and the secondtorsion beam.

Embodiments of the disclosure also provide a method for driving amicromachined mirror assembly. A resonant frequency of the micromachinedmirror assembly is set at an initial value. A DC voltage differencealong an axis of the micromachined mirror assembly to decrease theresonant frequency to a first operational value lower than the initialvalue during operation of the micromachined mirror assembly.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory onlyand are not restrictive of the invention, as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a schematic diagram of an exemplary vehicle equippedwith a LiDAR system, according to embodiments of the disclosure.

FIG. 2 illustrates a block diagram of an exemplary LiDAR system having atransmitter with a scanner, according to embodiments of the disclosure.

FIG. 3A illustrates a schematic diagram of an exemplary micromachinedmirror assembly, according to embodiments of the disclosure.

FIG. 3B illustrates a top perspective view of the exemplarymicromachined mirror assembly in FIG. 3A, according to embodiments ofthe disclosure.

FIG. 4A illustrates a waveform of an exemplary voltage signal applied tothe actuators of a micromachined mirror assembly, according toembodiments of the disclosure.

FIG. 4B illustrates a waveform of another exemplary voltage signalapplied to the actuators of a micromachined mirror assembly, accordingto embodiments of the disclosure.

FIG. 5 illustrates a schematic diagram of another exemplarymicromachined mirror assembly, according to embodiments of thedisclosure.

FIG. 6A illustrates a schematic diagram of a design of the exemplarymicromachined mirror assembly in FIG. 5 , according to embodiments ofthe disclosure.

FIG. 6B illustrates a schematic diagram of another design of theexemplary micromachined mirror assembly in FIG. 5 , according toembodiments of the disclosure.

FIG. 7 illustrates a flow chart of an exemplary method for driving amicromachined mirror assembly, according to embodiments of thedisclosure.

DETAILED DESCRIPTION

Reference will now be made in detail to the exemplary embodiments,examples of which are illustrated in the accompanying drawings. Whereverpossible, the same reference numbers will be used throughout thedrawings to refer to the same or like parts.

FIG. 1 illustrates a schematic diagram of an exemplary vehicle 100equipped with a LiDAR system 102, according to embodiments of thedisclosure. Consistent with some embodiments, vehicle 100 may be asurvey vehicle configured for acquiring data for constructing ahigh-definition map or 3-D buildings and city modeling.

As illustrated in FIG. 1 , vehicle 100 may be equipped with LiDAR system102 mounted to a body 104 via a mounting structure 108. Mountingstructure 108 may be an electro-mechanical device installed or otherwiseattached to body 104 of vehicle 100. In some embodiments of the presentdisclosure, mounting structure 108 may use screws, adhesives, or anothermounting mechanism. Vehicle 100 may be additionally equipped with asensor 110 inside or outside body 104 using any suitable mountingmechanisms. Sensor 110 may include sensors used in a navigation unit,such as a Global Positioning System (GPS) receiver and one or moreInertial Measurement Unit (IMU) sensors. It is contemplated that themanners in which LiDAR system 102 or sensor 110 can be equipped onvehicle 100 are not limited by the example shown in FIG. 1 and may bemodified depending on the types of LiDAR system 102 and sensor 110and/or vehicle 100 to achieve desirable 3-D sensing performance.

Consistent with some embodiments, LiDAR system 102 and sensor 110 may beconfigured to capture data as vehicle 100 moves along a trajectory. Forexample, a transmitter of LiDAR system 102 is configured to scan thesurrounding and acquire point clouds. LiDAR system 102 measures distanceto a target by illuminating the target with pulsed laser beam andmeasuring the reflected pulses with a receiver. The laser beam used forLiDAR system 102 may be ultraviolet, visible, or near infrared. In someembodiments of the present disclosure, LiDAR system 102 may capturepoint clouds. As vehicle 100 moves along the trajectory, LiDAR system102 may continuously capture data. Each set of scene data captured at acertain time range is known as a data frame.

FIG. 2 illustrates a block diagram of an exemplary LiDAR system 102having a transmitter 202 with a scanner 210, according to embodiments ofthe disclosure. LiDAR system 102 may include transmitter 202 and areceiver 204. Transmitter 202 may emit laser beams within a scan angle.Transmitter 202 may include one or more laser sources 206 and a scanner210. As described below in detail, scanner 210 may include amicromachined mirror assembly (not shown) having a resonant frequencythat can be tuned during the operation of the micromachined mirrorassembly.

As part of LiDAR system 102, transmitter 202 can sequentially emit astream of pulsed laser beams in different directions within its scanangle, as illustrated in FIG. 2 . Laser source 206 may be configured toprovide a laser beam 207 (referred to herein as “native laser beam”) ina respective incident direction to scanner 210. In some embodiments ofthe present disclosure, laser source 206 may generate a pulsed laserbeam in the ultraviolet, visible, or near infrared wavelength range.

In some embodiments of the present disclosure, laser source 206 is apulsed laser diode (PLD). A PLD may be a semiconductor device similar toa light-emitting diode (LED) in which the laser beam is created at thediode's junction. In some embodiments of the present disclosure, a PLDincludes a PIN diode in which the active region is in the intrinsic (I)region, and the carriers (electrons and holes) are pumped into theactive region from the N and P regions, respectively. Depending on thesemiconductor materials, the wavelength of incident laser beam 207provided by a PLD may be smaller than 1,100 nm, such as 405 nm, between.445 nm and 465 nm, between 510 nm and 525 nm, 532 nm, 635 nm, between650 nm and 660 nm, 670 nm, 760 nm, 785 nm, 808 nm, or 848 nm.

Scanner 210 may be configured to emit a laser beam 209 to an object 212in a first direction. Object 212 may be made of a wide range ofmaterials including, for example, non-metallic objects, rocks, rain,chemical compounds, aerosols, clouds and even single molecules. Thewavelength of laser beam 209 may vary based on the composition of object212. At each time point during the scan, scanner 210 may emit laser beam209 to object 212 in a direction within the scan angle by rotating themicromachined mirror assembly as the incident angle of incident laserbeam 207 may be fixed. In some embodiments of the present disclosure,scanner 210 may also include optical components (e.g., lenses, mirrors)that can focus pulsed laser light into a narrow laser beam to increasethe scan resolution and range of object 212.

As part of LiDAR system 102, receiver 204 may be configured to detect areturned laser beam 211 returned from object 212 in a differentdirection. Receiver 204 can collect laser beams returned from object 212and output electrical signal reflecting the intensity of the returnedlaser beams. Upon contact, laser light can be reflected by object 212via backscattering, such as Rayleigh scattering, Mie scattering, Ramanscattering, and fluorescence. As illustrated in FIG. 2 , receiver 204may include a lens 214 and a photodetector 216. Lens 214 may beconfigured to collect light from a respective direction in its field ofview (FOV). At each time point during the scan, returned laser beam 211may be collected by lens 214. Returned laser beam 211 may be returnedfrom object 212 and have the same wavelength as laser beam 209.

Photodetector 216 may be configured to detect returned laser beam 211returned from object 212. Photodetector 216 may convert the laser light(e.g., returned laser beam 211) collected by lens 214 into an electricalsignal 218 (e.g., a current or a voltage signal). The current isgenerated when photons are absorbed in the photodiode. In someembodiments of the present disclosure, photodetector 216 may include anavalanche photodiode (APD), such as a single photon avalanche diode(SPAD), a SPAD array, or a silicon photo multiplier (SiPM).

Although scanner 210 is described as part of transmitter 202, it isunderstood that in some embodiments, scanner 210 can be part of receiver204, e.g., before photodetector 216 in the light path. The inclusion ofscanner 210 in receiver can ensure that photodetector 216 only captureslight, e.g., returned laser beam 211 from desired directions, therebyavoiding interferences from other light sources, such as the sun and/orother LiDAR systems. By increasing the aperture of mirror assembly inscanner 210 in receiver 204, the sensitivity of photodetector 216 can beincreased as well.

As described above, the incident angle of incident laser beam 207 may befixed relative to scanner 210, and the scanning of laser beam 209 may beachieved by rotating a single micro mirror or an array of micromachinedmirror assembly in scanner 210. FIG. 3A illustrates a schematic diagramof an exemplary micromachined mirror assembly 300, according toembodiments of the disclosure. FIG. 3B illustrates a top perspectiveview of micromachined mirror assembly 300 in FIG. 3A, according toembodiments of the disclosure. Different from some micromachined mirrorassemblies having fixed resonant frequencies that cannot be adjustedduring the operation, the operational resonant frequency ofmicromachined mirror assembly 300 can be adjusted online during theoperation, thereby allowing resonant frequency compensation due totemperature variation and/or enabling resonant frequency match amongmultiple micromachined mirror assemblies (e.g., in an array) due tofabrication process variation.

As illustrated in FIGS. 3A-3B, micromachined mirror assembly 300 mayinclude a micro mirror 302 and a pair of first and second torsion beams304 and 306 mechanically connected to micro mirror 302 along an axis 303of micro mirror 302. Micro mirror 302 may be configured to tilt aroundaxis 303 as torsion beams 304 and 306 rotate due to the rigid jointbetween micro mirror 302 and torsion beams 304 and 306. In someembodiments, micro mirror 302 and torsion beams 304 and 306 are formedusing MEMS microfabrication techniques from a same rigid semiconductorstructure, such as a single crystalline silicon wafer. Micro mirror 302may be covered by a reflective layer disposed on its top surface (facingincident laser beam). The reflective layer may be reflective to anincident laser beam, which is reflected by micromachined mirror assembly300 to form a reflected laser beam. By tilting micro mirror 302, theincident laser beam may be reflected to a different direction, i.e., toform another reflected laser beam. It is understood that although micromirror 302 is in a rectangle shape as shown in FIGS. 3A-3B, it isunderstood that the shape of micro mirror 302 is not limited to arectangle shape and may vary in other examples, such as a square, round,or eclipse shape.

Micromachined mirror assembly 300 may further include a pair of firstand second anchors 308 and 310 each mechanically coupled to a respectiveend of torsion beam 304 or 306 that is farther away from micro mirror302 and along axis 303. The other end of torsion beam 304 or 306 ismechanically coupled to micro mirror 302. Each one of anchors 308 and310 is affixed on a base (not shown) of micromachined mirror assembly300, according to some embodiments. Anchors 308 and 310 may be affixedto the base as both are formed using MEMS microfabrication techniquesfrom a same rigid semiconductor structure, such as a single crystallinesilicon wafer or may be joined together using thermal bonding, adhesivebonding, or soldering. Each one of torsion beams 304 and 306 issuspended from the base, i.e., leaving a space therebetween, to allowcertain movement (e.g., rotation and/or displacement) of torsion beams304 and 306 with respect to the base and anchors 308 and 310. In someembodiments, each one of torsion beams 304 and 306 is configured to tiltaround axis 303, thereby driving the rotation of micro mirror 302. Insome embodiments, each one of torsion beams 304 and 306 is made of arigid material, such as silicon, with substantially zero displacement ina direction along axis 303 (i.e., the axial direction).

As illustrated in FIGS. 3A-3B, a first DC voltage V_(i) may be appliedto torsion beam 304 and a second DC voltage V₀ may be applied to torsionbeams. In some embodiments, the voltage may be provided using anelectrical power source such as an AC- to DC supply, a switched-modepower supply, a linear regulator etc. For example, a first electrode maybe applied to anchor 308 to provide first DC voltage V_(i) and a secondelectrode may be applied to anchor 310 to provide second DC voltage V₀.First DC voltage V_(i) and second DC voltage V₀ may have differentvalues resulting in current i₀ to pass through torsion beams 304 and306, and micro mirror 302. Current i₀ may be transformed into heat ontorsion beams 304 and 306, and micro mirror 302. The heat will changethe temperature of components of micromachined mirror assembly 300especially torsion beams 304 and 306 because of its relatively highelectrical resistance due to its' shape. For crystalline materials suchas single crystalline silicon wafer, the Young's modulus for thematerial can be increased when the temperature increases. Thetemperature dependence of Young's modulus for crystalline materials canbe attributed to the enharmonic effects of lattice vibrations and alsoto changes in the bond length with temperature. The increase of Young'smodulus can cause the resonant frequency of micromachined mirrorassembly 300 to decrease.

On the other hand, the heat may also cause thermal expansion of torsionbeams 304 and 306, and thus be transformed into compression stressesapplied to micro mirror 302. The thermal expansion and the compressionstresses may cause a decrease of the operational resonant frequency ofmicro mirror 302. In some embodiments, the change of operationalresonant frequency of micro mirror 302 may be calculated by equation(1):

$\begin{matrix}{f_{o} \cong {f_{nom}\left\{ {1 - {\frac{1}{2}\frac{V_{P}^{2}\varepsilon_{o}{hW}_{e}}{\left\lbrack {d_{o} + {\left( {\alpha_{sub} - \alpha_{e}} \right){L_{e}\left( {T - T_{o}} \right)}}} \right\rbrack^{3}k_{m}}}} \right\}}} & (1)\end{matrix}$

where f_(nom) is the center frequency of micro mirror 302 at a nominaltemperature T₀ and with V_(P)=0V, k_(m) is the integrated mechanicalstiffness of micro mirror 302 at its midpoint, d_(o) is theelectrode-to-torsion beam gap spacing at T_(o), W_(e) is the width ofthe electrode, L_(e) is the length of the suspended portion of theelectrode (that is free to expand), α_(e) and α_(sub) are the thermalexpansion coefficients of the electrode and substrate materials,respectively.

In some embodiments, first DC voltage V_(i) and second DC voltage V₀ ismaintained during the operation of micromachined mirror assembly 300,thereby tuning the operational resonant frequency of micro mirror 302from its initial resonant frequency. For one specific example, the DCvoltage difference between first voltage V_(i) and second DC voltage V₀may be about 3V (e.g., 0V for first DC voltage V_(i) and −3V for secondDC voltage V₀, or 3V for first voltage V_(i) and 0V for second DCvoltage V₀). Current i₀ may be about 100 mA based on the electricalresistance of all components of micromachined mirror assembly 300 alongaxis 303. The heat generated on torsion beams 304 and 306 and micromirror 302 may be transformed into thermal expansion and compressionstresses applied to micro mirror 302 causing the operational resonantfrequency of micro mirror 302 to decrease from about 5000 Hz to about4950 Hz.

In some embodiments, an electrical resistance R may be added between theelectrodes as part of an overload protection circuit to protect thecircuit from overcurrent. It is understood that the direction of currenti₀ may not affect the decrease of the operational resonant frequency ofmicro mirror 302.

As illustrated in FIGS. 3A-3B, micromachined mirror assembly 300 mayfurther include a pair of first and second actuators 312 and 314mechanically coupled to pair of torsion beams 304 and 306, respectively.A first actuator 312 may be configured to apply a first torsional stressaround axis 303 to a first torsion beam 304, and a second actuator 314may be configured to apply a second torsional stress around axis 303 toa second torsion beam 306. Consistent with some embodiments of thepresent disclosure, in some embodiments, the first torsional stress andsecond torsional stress have the same predetermined magnitudes resultingin torsion beams 304 and 306 along with micro mirror 302 to rotate alongaxis 303 at substantially the operational resonant frequency of micromirror 302 (e.g., at the operational resonant frequency of micro mirror302).

In some other embodiments, the first torsional stress and secondtorsional stress may have different magnitudes resulting in torsionalstresses on torsion beams 304 and 306. For example, first and secondactuators 312 and 314 may create unbalanced torsional stresses ontorsion beams 304 and 306 on different sides of micro mirror 302 alongaxis 303. The unbalanced torsional stresses (i.e., a torsion) can betranslated into a tensional stress in the axial direction, which canincrease the resonant frequency of micro mirror 302. In someembodiments, the tensional stress caused by the torsion is maintainedduring the operation of micromachined mirror assembly 300, therebytuning the operational resonant frequency of micro mirror 302 from itsinitial resonant frequency. It is understood that the direction oftorsion may not affect the increase of the operational resonantfrequency of micro mirror 302. That is, the first torsional stressapplied by first actuator 312 may be greater than the second torsionalstress applied by second actuator 314, or vice versa.

As illustrated in FIGS. 3A-3B, first and second actuators 312 and 314may be electrostatic actuators, such as a set of comb drives.Electrostatic actuators rely on the force between two conductingelectrodes when a voltage is applied between them. Depending on thearrangement of the electrodes, various types of electrostatic actuatorsare possible, such as comb drive electrostatic actuators, parallel plateelectrostatic actuators, rotational electrostatic actuators cantileverelectrostatic actuators, to name a few. For example, as shown in FIG.3B, first actuator 312 may be an electrostatic comb drive actuator thatincludes a moveable comb 320 fixed to first torsion beam 304 and a pairof fixed combs 322 and 324 fixed to the base on different sides of firsttorsion beam 304. First torsion beam 304 and moveable comb 320 may bearranged in a plane above fixed combs 322 and 324. By alternatinglyapplying a voltage signal to the pair of fixed combs 322 and 324, firsttorsion beam 304 and moveable comb 320 can tilt around axis 303.Similarly, second actuator 314 may be an electrostatic comb driveactuator that includes moveable comb 326 fixed to second torsion beam306 and a pair of fixed combs 328 and 330 fixed to the base on differentsides of second torsion beam 306. Second torsion beam 306 and moveablecomb 326 may be arranged in a plane above fixed combs 328 and 330. Byalternatingly applying a voltage signal to the pair of fixed combs 328and 330, second torsion beam 306 and moveable comb 326 can tilt aroundaxis 303 as well.

In some embodiments, the unbalanced torsional stresses created by firstand second actuators 312 and 314 are achieved by applying two differentAC voltages V1 and V2 to first and second actuators 312 and 314,respectively. The difference between AC voltages V1 and V2 may beconverted into the magnitude difference of the first and secondtorsional stresses by a pair of electrostatic actuators, such as twosets of comb drives, as shown in FIGS. 3A-3B. The difference between ACvoltages V1 and V2 may be created in any suitable ways, such as byintroducing a DC offset (DC bias) or a phase offset (phase shift). Forexample, as shown in FIG. 4A, a DC offset Av may be applied to one ofthe two AC voltages, such as V1, to cause the difference of voltagemagnitude between V1 and V2 at each time point. In another example asshown in FIG. 4B, a phase offset may be applied to one of the two ACvoltages, such as V2, to cause a phase shift in V2 relative to V1. Thephase shift in turn can cause the difference of voltage magnitudebetween V1 and V2 at each time point. In some embodiments, thedifference of voltage magnitude between V1 and V2 is maintained to be atsubstantially the same level at each time point to maintain a constantoperational frequency increase during the entire operation cycle. Thecontrol of voltage signals V1 and V2 may be achieved by a controller(not shown) operatively coupled to first and second actuators 312 and314 to create and maintain the operational frequency increase as thedesired level.

It is understood that the type of electrostatic actuators for creatingunbalanced torsional stresses is not limited to comb drive actuators andcan include any other suitable electrostatic actuators, such as parallelplate electrostatic actuators, rotational electrostatic actuators, orcantilever electrostatic actuators, to name a few. It is also understoodthat the type of actuators for creating unbalanced torsional stresses isnot limited to electrostatic actuators and can include any othersuitable actuators, such as piezoelectric actuators, electromagneticactuators, thermal actuators, etc.

As described above, the current introduced by first DC voltage V_(i) andsecond DC voltage V₀ may decrease the resonant frequency of micro mirror302 from its initial resonant frequency and optionally in someembodiments, the torsion induced by first and second actuators 312 and314 can increase the resonant frequency of micro mirror 302 from itsinitial resonant frequency. In some embodiments, a controller (notshown) is configured to dynamically tune the operational resonantfrequency of micro mirror 302 by adjusting the voltage signals V1 and V2applied to first and second actuators 312 and 314 and/or adjusting thecurrent i₀ passes through torsion beams 304 and 306 and micro mirror 302by adjusting first DC voltage V_(i) and second DC voltage V₀ applied totorsion beams 304 and 306.

In addition to indirectly translating a torsion into the tensionalstress, another way to introducing tensional stress for increasingresonant frequency of a micro mirror is to directly apply a tensionalstress through one or two suspended beams along the axis of the micromirror. For example, FIG. 5 illustrates a schematic diagram of anotherexemplary micromachined mirror assembly 500, according to embodiments ofthe disclosure. Similar to micromachined mirror assembly 300 describedabove in FIGS. 3A-3B, micromachined mirror assembly 500 also includes amicro mirror 502, a first torsion beam 504 and a second torsion beam 506each mechanically coupled to micro mirror 502 along an axis 503 of micromirror 502, and a first anchor 508 and a second anchor 510 each fixed onthe base of micromachined mirror assembly 500 and mechanically coupledto a respective end of first or second torsion beam 504 or 506.Micromachined mirror assembly 500 may also have first DC voltage V_(i)and second DC voltage V₀ applied to torsion beams 504 and 506 in thesame manner as the counterpart of micromachined mirror assembly 300 inFIGS. 3A-3B. In some embodiments, micromachined mirror assembly 500further includes a first torsional actuator 512 mechanically coupled tofirst torsion beam 504 and configured to apply a first torsional stressaround axis 503 to first torsion beam 504, and a second torsionalactuator 514 mechanically coupled to second torsion beam 506 andconfigured to apply a second torsional stress around axis 503 to secondsuspended beam 506. The first torsional stress and second torsionalstress may be different to create a torsion that can be translated intoa tensional stress in the axial direction, as described above withrespect to micromachined mirror assembly 300. The details of micromirror 502, first and second torsion beams 504 and 506, first and secondanchors 508 and 510, first DC voltage V_(i) and second DC voltage V₀ andfirst and second torsional actuators 512 and 514 of micromachined mirrorassembly 500 have been described above with respect to theircounterparts of micromachined mirror assembly 300 in FIGS. 3A-3B andthus, are not repeated.

As shown in FIG. 5 , micromachined mirror assembly 500 further includesa pair of tensional actuators 516 and 518 mechanically coupled to an endof respective first and second torsion beams 504 and 506 and configuredto apply a tensional stress along axis 503 to first and second torsionbeams 504 and 506. The tensional stress can be applied directly bytensional actuators 516 and 518 in the axial direction away from micromirror 502 to increase the operational frequency of micro mirror 502. Itis understood that in some embodiments, instead of having tensionalactuators 516 and 518 on both sides of micro mirror 502 as shown in FIG.5 , only one of tensional actuators 516 and 518 is kept on one side ofmicro mirror 502, i.e., mechanically coupled to one of torsion beams 504and 506, which still can apply a tensional stress along axis 503.Tensional actuators 516 and 518 can be any suitable actuators that canapply a tensional stress to first and second torsion beams 504 and 506in the axial direction away from micro mirror 502, i.e., pulling firstand second torsion beams 504 and 506 away from micro mirror 502 toincrease the tension axially within micromachined mirror assembly 500,and thus, increase the resonant frequency of micro mirror 502 during itsoperation. Tensional actuators 516 and 518 can be, for example,electrostatic actuators, piezoelectric actuators, electromagneticactuators, thermal actuators, etc.

For example, FIG. 6A illustrates a schematic diagram of a design ofmicromachined mirror assembly 500 in FIG. 5 , according to embodimentsof the disclosure. FIG. 6B illustrates a schematic diagram of anotherdesign of micromachined mirror assembly 500 in FIG. 5 , according toembodiments of the disclosure. In both examples, a tensional actuator,such as one or more sets of comb drive electrostatic actuators, isdisposed on one side of micro mirror 502 to apply a tensional stressalong axis 503 of micro mirror 502 to increase the operational resonantfrequency of micro mirror 502. It is understood that in otherembodiments, another tensional actuator may be similarly disposed on theother side of micro mirror 502 as well.

In one design as shown in FIG. 6A, a set of comb drives 602 ismechanically coupled to an end of second suspended beam 506 andconfigured to apply a tensional stress along axis 503 to second torsionbeam 506. In some embodiments, set of comb drives 602 include a fixedcomb 604 fixed to second anchor 510 that does not move relative to thebase of micromachined mirror assembly 500, and a movable comb 606 fixedto second torsion beam 506 that is movable along the axial direction. Byapplying a voltage to set of comb drives 602, movable comb 606 can beattracted by fixed comb 604 toward second anchor 510 and thus, create atensional stress to second torsion beam 506 in the axial direction awayfrom micro mirror 502. It is understood that fixed comb 604 may not befixed to second anchor 510 in some embodiments. In some embodiments,fixed comb 604 is electrically separated from the rest of components(e.g., micro mirror 502, first and second torsion beams 504 and 506,first and second anchors 508 and 510, and movable comb 606) inmicromachined mirror assembly 500.

In another design as shown in FIG. 6B, two sets of comb drives 610 and616 each is mechanically coupled to a respective end of a firstsub-torsion beam 608 and a second sub-torsion beam 614. First and secondsub-torsion beams 608 and 614 may be mechanically coupled to aconnection point of second torsion beam 506 in a certain angle to formrigid joints, such that tensional stresses applied to first and secondsub-torsion beams 608 and 614 can be transferred to second torsion beam506, which can be in turned transferred to micro mirror 502 along axis503 of micro mirror 502 to increase the operational resonant frequencyof micro mirror 502. In some embodiments, by changing the direction ofthe pulling of first and second sub-torsion beams 608 and 614 towardsmicro mirror 502, the operational resonant frequency of micro mirror 502may be decreased. In some embodiments, the connection point is close tosecond anchor 510 to minimize the rotation of first and secondsub-torsion beams 608 and 614 around axis 503. Similar to set of combdrive 602 described above with respect to FIG. 6B, each set of combdrives 610 or 616 may include a movable comb drive fixed to respectivefirst sub-torsion beam 608 or second sub-torsion beam 614, and a fixedcomb drive fixed to a respective anchor 612 or 618. By applying avoltage to each set of comb drives 610 or 616, each movable comb can beattracted by the respective fixed comb toward anchor 612 or 618 andthus, create a tensional stress to respective first sub-torsion beam 608or second sub-torsion beam 614, which can be in turned transferred tosecond torsion beam 506 along axis 503.

As described above, the current introduced by first DC voltage V_(i) andsecond DC voltage V₀ may decrease the resonant frequency of micro mirror502 from its initial resonant frequency and in some embodiments,optionally, the tensional stress induced directly by tensional actuators516 and/or 518 can increase the resonant frequency of micro mirror 502from its initial resonant frequency. In some embodiments, a controller(not shown) is configured to dynamically tune the operational resonantfrequency of micro mirror 502 by adjusting torsional stress on tensionalactuators 516 and/or 518, and/or adjusting the current i₀ passes throughtorsion beams 504 and 506 and micro mirror 502 by adjusting first DCvoltage V_(i) and second DC voltage V₀. In some embodiments, anelectrical resistance R may be added between the electrodes as part ofan overcurrent protection circuit to protect the circuit fromovercurrent.

FIG. 7 illustrates a flow chart of an exemplary method 700 for driving amicromachined mirror assembly, according to embodiments of thedisclosure. For example, method 700 may be implemented by micromachinedmirror assemblies 300 and 500 described above. However, method 700 isnot limited to that exemplary embodiment. Method 700 may include stepsS702-S704 as described below. It is to be appreciated that some of thesteps may be optional to perform the disclosure provided herein.Further, some of the steps may be performed simultaneously, or in adifferent order than shown in FIG. 7 .

In step S702, a resonant frequency of a micromachined mirror assembly isset at an initial value. The initial value may be pre-set by the designand fabrication process of the micromachined mirror assembly. In someembodiments, the initial value is pre-set as the maximized value, whichcan be decreased to a lower value during the operation by decreasing theresonant frequency during the operation of the micromachined mirrorassembly.

In step S704, a DC voltage difference is applied along an axis of themicromachined mirror assembly to decrease the resonant frequency to afirst operational value lower than the initial value during operation ofthe micromachined mirror assembly. In some embodiments, the DC voltagedifference results in a current to pass through the torsion beams, andthe micro mirror. The current may be transformed into heat on thetorsion beams and the micro mirror. The heat may be transformed intothermal expansion thus lead to compression stresses applied to the micromirror. The thermal expansion and the compression stresses may cause adecrease of the operational resonant frequency, thereby decreasing thefirst operational value. In some embodiments, the initial value of theresonant frequency is pre-set as the maximum value, such that theoperational resonant frequency is decreased to the desired secondoperational value by applying a suitable level of heat to themicromachined mirror assembly.

It is understood that in some embodiments, the initial value of theresonant frequency of the micromachined mirror assembly is not pre-setat the maximum value, and step S704 can be performed in any suitabletimes to dynamically tune the initial value to a desired operationalvalue.

It will be apparent to those skilled in the art that variousmodifications and variations can be made to the disclosed system andrelated methods. Other embodiments will be apparent to those skilled inthe art from consideration of the specification and practice of thedisclosed system and related methods.

It is intended that the specification and examples be considered asexemplary only, with a true scope being indicated by the followingclaims and their equivalents.

What is claimed is:
 1. A micromachined mirror assembly, comprising: amicro mirror configured to tilt around an axis; and a first torsion beamhaving a first end to which a first voltage is applied and a second endmechanically coupled to the micro mirror along the axis; and a secondtorsion beam having a first end to which a second voltage is applied anda second end mechanically coupled to the micro mirror along the axis,wherein the first voltage and the second voltage has an adjustablevoltage difference.
 2. The micromachine mirror assembly of claim 1,wherein the first voltage is a first DC voltage and the second voltageis a second DC voltage.
 3. The micromachine mirror assembly of claim 1,wherein the voltage difference between the first voltage and the secondvoltage decreases a resonant frequency of the micro mirror.
 4. Themicromachine mirror assembly of claim 3, further comprising a controllerconfigured to dynamically tune the resonant frequency of the micromirror during operation of the micromachined mirror assembly byadjusting the voltage difference between the first voltage and thesecond voltage.
 5. The micromachine mirror assembly of claim 1, whereinthe first end of the first torsion beam is coupled to a first anchor,and the first end of the second torsion beam is coupled to a secondanchor, wherein the first anchor and the second anchor is affixed to abased to suspend the first torsion beam and the second torsion beam overthe base.
 6. The micromachine mirror assembly of claim 5, wherein afirst electrode is applied to the first anchor to provide the firstvoltage and a second electrode is applied to the second anchor toprovide the second voltage.
 7. The micromachine mirror assembly of claim6, wherein an overload protection circuit is placed between the firstelectrode and the second electrode.
 8. The micromachine mirror assemblyof claim 6, further comprising: at least one actuator mechanicallycoupled to at least one of the first torsion beam or the second torsionbeam, wherein the at least one actuator causes a tensional stress alongthe axis.
 9. The micromachine mirror assembly of claim 8, wherein the atleast one actuator comprises: a first torsional actuator coupled to thefirst torsion beam and configured to apply a first torsional stressaround the axis to the first torsion beam; and the a second torsionalactuator coupled to the second torsion beam and configured to apply asecond torsional stress around the axis to the second torsion beam,wherein a difference between the first torsional stress and the secondtorsional stress causes the tensional stress along the axis.
 10. Themicromachine mirror assembly of claim 8, wherein the at least oneactuator comprises at least one tensional actuator configured to causethe tensional stress along the axis.
 11. The micromachine mirrorassembly of claim 8, wherein the at least one actuator is anelectrostatic actuator.
 12. The micromachine mirror assembly of claim 8,wherein the tensional stress along the axis increases a resonantfrequency of the micro mirror.
 13. The micromachine mirror assembly ofclaim 12, further comprising a controller configured to dynamically tunethe resonant frequency of the micro mirror during operation of themicromachined mirror assembly by adjusting the tensional stress alongthe axis.
 14. A micromachined mirror assembly, comprising: a micromirror configured to tilt around an axis; a first torsion beam and asecond torsion beam each mechanically coupled to the micro mirror alongthe axis, wherein a voltage difference is applied to the first torsionbeam and the second torsion beam; and at least one actuator mechanicallycoupled to at least one of the first torsion beam or the second torsionbeam, wherein the at least one actuator causes a tensional stress alongthe axis.
 15. The micromachine mirror assembly of claim 14, wherein thevoltage difference applied to the first torsion beam and the secondtorsion beam decreases a resonant frequency of the micro mirror.
 16. Themicromachine mirror assembly of claim 14, wherein the tensional stressalong the axis increases a resonant frequency of the micro mirror. 17.The micromachine mirror assembly of claim 14, further comprising acontroller configured to dynamically tune a resonant frequency of themicro mirror during operation of the micromachined mirror assembly byadjusting the voltage difference applied to the first torsion beam andthe second torsion beam or the tensional stress along the axis.
 18. Themicromachine mirror assembly of claim 14, wherein the at least oneactuator comprises: a first torsional actuator coupled to the firsttorsion beam and configured to apply a first torsional stress around theaxis to the first torsion beam; and a second torsional actuator coupledto the second torsion beam and configured to apply a second torsionalstress around the axis to the second torsion beam, wherein a differencebetween the first torsional stress and the second torsional stresscauses the tensional stress along the axis.
 19. The micromachine mirrorassembly of claim 14, wherein the at least one actuator comprises atleast one tensional actuator configured to cause the tensional stressalong the axis.
 20. A method for driving a micromachined mirrorassembly, comprising: operating the micromachined mirror assembly bytilting a micro mirror around an axis; and dynamically tuning a resonantfrequency of the micro mirror during the operation of the micromachinedmirror assembly by adjusting a voltage difference applied to a firsttorsion beam and a second torsion beam each mechanically coupled to themicro mirror along the axis or a tensional stress along the axis.